Lithography Solutionsheater solutions

In immersion lithography applications, water evaporation on the wafer surface causes dimensional instability that leads to imaging and overlay errors. Watlow’s integrated thermal solutions can control thermal expansion in these systems to improve tool performance. Beyond 7nm, technology nodes require EUV lithography and Watlow has thermal solutions to support the tin-based plasma light source systems.

Contact your Watlow semiconductor representative for more information.